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舉報評價

粉末與顆粒鍍膜原子層沉積系統(tǒng)-Powder ALD-研發(fā)與生產(chǎn)型

參考價	面議

參考價

面議

具體成交價以合同協(xié)議為準

促銷時間：

特價說明：

促銷詳細：

2020年01月08日至 2020年02月08日

特價促銷

模內(nèi)澆口分離自動化，降低對人的依賴度；傳統(tǒng)的塑膠模具開模后產(chǎn)品與澆口相連，需二道工序進行人工剪切分離，模內(nèi)熱切模具將澆口分離提前至開模前，消除后續(xù)工序，有利于生產(chǎn)自動化，降低對人的依賴。

粉末原子層沉積系統(tǒng)ALD美國ALDNANOSOLUTIONS公司技術，專注于粉末顆粒表面鍍膜

粉末原子層沉積系統(tǒng) ALD

美國ALD NANOSOLUTIONS公司技術，專注于粉末顆粒表面鍍膜。

專用于在粉末、顆粒表面沉積ALD薄膜，可用于科研，生產(chǎn)。單批次體積從45ml~150L，滿足科研到生產(chǎn)的需要?？沙练e氧化物，氮化物，金屬等類型薄膜?？捎糜阡囯x子電池、催化劑、等需要粉末鍍膜的行業(yè)。

專業(yè)的粉末鍍膜原子層沉積系統(tǒng)，為科研與生產(chǎn)提供專業(yè)的解決方案。

設備沉積方法有：流化床法、滾動法、振動法。

粉末原子層沉積系統(tǒng)型號:

FX系列：75 or 150 mL，適用于R&D

FP系列: 500 mL / 2 L / 5 L / 10 L，適用于R&D，生產(chǎn)

RX系列：10 or 40 mL，適用于R&D

RP系列： ~40L, 適用于生產(chǎn)

CVR系列：15L/hr to 150L/hr，適用于生產(chǎn)

粉末原子層沉積系統(tǒng)技術參數(shù)：

ALD REACTOR SYSTEMS	Fluidized Bed Reactors (FBR)	Rotary Reactors (Rotary)	Continuous Vibrating Reactors (CVR)
Substrate Volume	75mL to 10L per batch	10ml to 40L	15L/hr to 150L/hr
Substrate Mass (Density Dependent)	75g - 12.5kg per batch	10g - 50kg per batch	15kg/hr to 150kg/hr
Vapor Draw Sources	2 standard, up to 8	2 standard, up to 8	2 standard, up to 8
Regulatory Compliance	CE, GMP and ISO compliance upon request
Weight	300 lbs - 1,000 lbs (150kg - 500kg)	300lbs - 4,000lb (150kg - 2000kg)	500lbs - 8,000lb (250kg - 4000kg)
Venting Emissions and Abatement	Equipment can be designed to comply with local jurisdiction codes and regulations
Electrical Requirements	Project-specific and customized. Further details can be supplied upon request
Demonstrated Particle Diameters	10 nm - 500micron	10 nm - 200micron	5-50micron
Potential Particle Diameters	2 nm - 1mm	2 nm - 250px	10nm - 1 cm
Other Features	Highest Precursor Efficiency	Plasma ALD Compatible	Atmospheric Pressure Operation

Reactor Style:	Fluidization Reactor
Substrate Volume:	75 or 150 mL
Reactor Temperatures Range:	25 – 450 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 4
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	300 lbs/ 140 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Glovebox Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Fluidization Reactor
Substrate Volume:	500 mL / 2 L / 5 L / 10 L
Reactor Temperatures Range:	25 – 450 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	400 lbs/ 180 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Rotary Reactor
Substrate Volume:	~40 L
Reactor Temperatures Range:	25 – 200 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	500 lbs/ 230 kg
Options Available:	Substrate Loading Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources

Reactor Style:	Rotary Reactor
Substrate Volume:	10 or 40 mL
Reactor Temperatures Range:	25 – 200 °C
Maximum Process Line Temperatures:	200 °C
Vapor Draw Sources:	2 standard, up to 8
Dosing Valves:	Heated Metal Diaphragm
Vacuum Pump:	Rotary Vane (9 CFM or greater)
Regulatory Compliance:	CE Marked
Weight:	300 lbs/ 140 kg
Options Available:	Substrate Loading Plasma Source from Meaglow Low Vapor Pressure Containers capable of 150 °C Residual Gas Analyzer Waste Abatement Integrated Glovebox Research License for ALD on Particles Various Vapor Sources